Maskless exposure device "ME-120F"
Supports up to 12-inch wafers! Direct drawing compatible with general-purpose CAD eliminates the costs and time associated with photomask production!
◆Solving the Challenges of Photolithography with Direct Drawing The maskless exposure device performs direct drawing on the workpiece using a DMD (Digital Micromirror Device). By eliminating the enormous costs and time required for photomask production, the challenges of traditional photolithography processes are resolved, making the prototyping of semiconductor devices more accessible. ◆Selectable Exposure Modes Since 2016, a fine exposure mode utilizing pixel interpolation technology has been standard. While the throughput time is longer compared to the standard exposure mode, the data reproducibility of diagonal lines and curved patterns is significantly improved. ◇What is DMD? DMD refers to hundreds of thousands of tiny mirrors arranged in a grid pattern. By illuminating these mirrors and controlling each one ON/OFF, image data created with general-purpose CAD is projected onto the workpiece. The light source uses LED light, which is long-lasting and economical.
- Company：ピーエムティー 本社・工場
- Price：Other
